Sputtering Target in USA

• Weight (lbs) : 1-2 3-10 11-25 26-100
• Particle Size : inquire
• Purity : 99.5-99.9

Specifications Purity99.5-99.9 Particle Sizeinquire CAS24304-00-5 Melting Point2200oC 3992oF Density3.26 Gcm3 CompositionAl - 65.8 , N - 34.2 Crystal StructureHex FormSputtering Targets ApplicationsThin Film Deposition Optical Coatings Mohs Hardness @ 20oC09-Oct Cost Per Pound Weight (lbs)Price 1-2inquire 3-1 more...

SAFINA, a.s. offers its customers the technology of silver sputtering targets for flat glass production, memory media targets, decorative layer production targets, surface finishing tools, and more. Targets are made of following precious metals and their alloys eg. Ag, Au, Pt, Pd, Zn, Al, Cu, Ti. We also offe more...

Calix Ceramic Solutions offers a low resistivity sintered silicon carbide that is an excellent material choice for your ceramic target requirements. Our electrically conductive sintered silicon carbide can be DC magnetron sputtered, perfect for your sputter coating. The material's high density and uniform ele more...

Materials and purity range: Pure elements and any kind of custom metal-base alloys or ceramic mixtures from Aluminum to Zirconium with purities from 99.5 to 99.9999 are available. We attach analytical report and MSDS for each shipped target Configurations and shapes: Rectangular, planar, circular, rotatable, more...

Sputtering Targets The Technical Ceramics business of Morgan Advanced Materials are specialists in the manufacture of ceramic sputtering targets for the semiconductor industry manufactured from 94%-99.99% alumina and CVD silicon carbide (SiC) for physical vapour deposition (PVD) applications. Our alumina sput more...