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Other Products / Services #4954849

DRY PUMP GAS ABATEMENT SYSTEMS

  • pump quantity 1~8 units
EBARA's Dry Pump Integrated Gas Abatement System is a harmonized system between vacuum technology and abatement technology based upon EBARAs best know-how. The system is designed in accordance with customers facility needs for customized integrated solutions.
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MODEL EGC

  • UNIT mbar (Torr)
  • EGPC550 Tungsten 5 x 10-5 .1500 (3.8x10-5 .125)
Your complete solution for process measurement and control. Compatible to all active gauges, the Model EGC controllers can monitor the entire pressure range from 10-10 to 1500 mbar (10-10 to 1125 Torr) and the setpoint status
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MODEL ET

  • Cooling system Water cooling
  • Weight, kg (lb) 10 (22)
The ET Turbo pump is equipped with five-axis magnetic bearings to ensure high-speed rotor rotation and position. Operating in a wide pressure range, the ET Turbo pump is designed to withstand highly reactive gases with its corrosion resistance.
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REVERSE PULSE TECHNOLOGY

  • Leak Rate: 1x10-7 mbar L/sec (min)
  • PTFE Media 99% efficiency @ 0.3 micron
EBARA designs and manufactures application-specific filtration products capable of operating in harsh environments while safeguarding operators and mission critical equipment. The EBARA Reverse Pulse Filter integrates proven reverse pulse technology to extend maintenance intervals, resulting in increased run time, fewer element changes, and reduced maintenance costs.
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MODEL NDC

EBARA's NDC are compact, magnetic pumps that transport and pressurize ultra-pure water and liquid chemicals to meet the requirements of the semiconductor and liquid-crystal manufacturing processes. Hydrodynamic bearings eliminate mechanical contact and the resulting particle emissions from the pump interior. Additionally, metallic ion elusion and pulsation have been virtually eliminated.
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MODEL PJ

  • Pump discharge pressure, Mpa 5, 10
  • Discharge flow rate, mL 50 (max)/stroke
  • Required air pressure Mpa 0.4
EBARA's PJ delivers high-pressure plunger pumps for single wafer jet cleaning with ultra-pure water. Pump surface purity is maintained through electrolytic polishing of the interior surfaces. Simple pump construction has minimized the area which comes in contact with the ultra-pure water and has eliminated the mixing of particles produced from the seal parts with the jet water.
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Ozone Systems

  • RAW GAS FLOW RATE (SLM) 2.5
  • OZONE CONCENTRATION 9.3
  • OZONE CONCENTRATION 200
  • GAS PRESSURE AT DISCHARGE 150 (21.7)
The ozonizer operates on the corona discharge principal (passing oxygen through an electric field of high potential) and employs a high performance trench discharger that differs from conventional ozone generator methods. The trench discharger is designed to have more surface area and is cooled by city water, creating large concentrations of ozone per unit discharge area.
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  • (Ebara Technologies)
  • Sacramento, CA 95838, United States
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